X-ray photoelectron spectroscopy (XPS) depth profiling
In XPS depth profiling, ion gun etching cycles and XPS analysis cycles are alternated to obtain semi-quantitative information on the elemental composition (at.%) of the sample as a function of depth.
The binding states of atoms can also be analyzed as a function of depth to determine the chemistry of the sample and its variations with depth.
XPS depth profiling is a destructive technique with an analysis area diameter ranging from 10 µm to several 100 µm.
Sputtering is done with an Ar-cluster GCIB ion beam or Ar monoatomic ions, and XPS measurements are typically performed using one of the following instruments:
PHI Genesis
Thermo Fisher ESCALAB 250Xi
PHI Quantum 2000
More information about the method:
X-ray photoelectron spectroscopy (XPS)- Suitable sample matrices
- Thin films, coatings, films, stack, bulk materials
- Typical turnaround time
- 2 – 3 weeks after receiving the samples
- Detection limit
- 0.1 - 1 at.%
- Available quality systems
- Measurlabs validated method
- Device types
- Method expert
Price
We also charge a 97 € service fee per order.
Large batches of samples are eligible for discounts.
Questions? We're happy to help.
Questions? We're happy to help.
Business hours: Mon–Fri 9 AM – 5 PM Finnish time (EST/EEST)
Other tests we offer
X-ray photoelectron spectroscopy (XPS)
AES measurement
RBS measurement
Semi-quantitative elemental screening with ICP-SFMS and ICP-AES
CHNOS analysis of organic materials
Total fluorine in plastic, paper, and other combustible materials
Polycyclic aromatic hydrocarbon (PAH) analysis of solid samples
ToF-ERDA measurement
Cryo-SEM-EDX imaging
SEM imaging
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